An article in the Journal of the Electrochemical Society describes an experiment to investigate the low-pressure vapor deposition of polysilicon. The experiment was carried out in a large-capacity reactor at Sematech in Austin, Texas. The reactor has several wafer positions, and four of these positions are selected at random. The response variable is film thickness uniformity. Three replicates of the experiment were run and the data are as follows: Wafer Position Uniformity Uniformity Uniformity
1 2.76 5.67 4.49
2 1.43 1.7 2.19
3 2.34 1.97 1.47
4 0.94 1.36 1.65

Required:
a. Construct a 95% confidence interval for the true average compressive strength when rodding level is at 20.
b. Construct a 95% confidence interval for the true effect of rodding level upon compressive strength when rodding level is at 15.
c. Construct a 95% individual confidence interval for the true difference in the average compressive strength of rodding levels 15 and 25.

What is the next step in the given proof? choose the most logical approach. a. statement: m 1 + m 2 + 2(m 3) = 180° reason: angle addition b. statement: m 1 + m 3 = m 2 + m 3 reason: transitive property of equality c. statement: m 1 = m 2 reason: subtraction property of equality d. statement: m 1 + m 2 = m 2 + m 3 reason: substitution property of equality e. statement: 2(m 1) = m 2 + m 3 reason: substitution property of equality

Amachine that produces a special type of transistor (a component of computers) has a 2% defective rate. the production is considered a random process where each transistor is independent of the others. (a) what is the probability that the 10th transistor produced is the first with a defect? (b) what is the probability that the machine produces no defective transistors in a batch of 100? (c) on average, how many transistors would you expect to be produced before the first with a defect? what is the standard deviation? (d) another machine that also produces transistors has a 5% defective rate where each transistor is produced independent of the others. on average how many transistors would you expect to be produced with this machine before the first with a defect? what is the standard deviation? (e) based on your answers to parts (c) and (d), how does increasing the probability of an event a↵ect the mean and standard deviation of the wait time until success?

Will give a: 122 b: 90 c: 48 d: 180