In a metal-oxide-semiconductor (MOS) device, a thin layer of SiO2 (density = 2.20 Mg/m3 ) is grown on a single crystal chip of silicon. How many Si atoms and how many O atoms are present per square millimeter of the oxide layer? Assume that the layer thickness is 220 nm .

Machinery that is a key part of the process and without which the plant or process cannot function is classifed as: (clo4) a)-critical machinery b)-essential machinery c)-general purpose machinery d)-none of the specified options.

Apiston-cylinder device contains 0.1 m3 of liquid water and 0.9 m3 of water vapor in equilibrium at 800 kpa. heat is transferred at constant pressure until the temperature of water reaches 350 °c. determine (a) the quality of water at the initial state (b) the work associated with this process, (c) the heat associated with this process.

How to increase the thermal officiency of an ideal simple rankino cycle? among these methods, which one is the best and why?