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Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 22.06.2019 01:00
Agas occupies 475 cm^3 at 313k. find its volume at 367k. you must show all of your work to receive credit. be sure to identify which of the gas laws you will be using
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Chemistry, 23.06.2019 06:40
A250 g sample of water with an initial temperatureof 98.8 closes 6500 joules of heat. what is the finaltemperature of the water?
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How much heat is required to increase the temperature of 35.0 grams of water from 10.0°c to 45.0°c?...
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