What is the name of the ionic compound csmc010-1.jpgs? cesium sulfur cesium sulfide dicesium sulfur dicesium sulfide

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

How many grams of co(g) are there in 74.5 ml of the gas at 0.933 atm and 30o c?

Summarize possible ways in which phases of matter could combine to form a solution.