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Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900หc, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 22.06.2019 10:10
Stage in which a starโs outer layers have started to cool and grow outward?
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Chemistry, 23.06.2019 02:00
As light moves from one material into the next, which of the following affects how much the light waves will refract, or bend? angle at which the ray strikes the medium color of the material density of the material temperature of the light wave
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A sample of CO2 is placed in a sealed rigid cylinder with a movable piton at 81 C and 101KPa. Sugges...
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