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Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900หc, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Calculate the ph of a .10m nh4cl solution. the kb value for nh3 is 1.8ร10^-5
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Account for the difference in the shape and color of the potential maps for ammonia and the ammonium...
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