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Chemistry, 21.06.2019 16:00
Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900Ëšc, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on
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Chemistry, 21.06.2019 17:50
Which best describes why nh4+ can form an ionic bond with cl-?
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Chemistry, 22.06.2019 08:20
What is the formula for the compound dinitrogen pentoxide? a. n4o5 b. n5o4 c. n4o6 d. n5o2 e. n2o5
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Which sequence correctly ranks elements from largest to smallest atomic radius?
(A.) Br, As, K
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