I am going to post a zoom thingy. This is ONLY FOR TUTORING.

Silica, sio2, is formed on silicon as an electrically insulating layer for microelectronic devices. silica is formed when silicon is exposed to o2 gas at an elevated temperature. at 900˚c, it takes 90 minutes for the oxygen to diffuse from the surface to form a 0.06 micron (0.06 x 10-6 m) thick layer of sio2 on

Iknow the answer to 13 is b and 14 is d. i just need to know why the correct answers are correct

For the following dehydrohalogenation (e2) reaction, draw the zaitsev product(s) resulting from elimination involving c3–c4 (i.e., the carbon atoms depicted with stereobonds). show the product stereochemistry clearly. if there is more than one organic product, both products may be drawn in the same box. ignore elimination involving c3 or c4 and any carbon atom other than c4 or c3.