In the production of many microelectronic devices, continuous chemical vapor deposition (cvd) processes are used to deposit thin and exceptionally uniform silicon dioxide films on silicon wafers. one cvd process involves the reaction between silane and oxygen at a very low pressure.

d.) circle motion requires a force to give it a centripetal acceleration.

a 20-cm-long, cylindrical graphite (pure carbon) rod is inserted into an oxidizing atmosphere at 1145 k and 1.013 x 105 pa pressure. the oxidizing process is limited by the diffu- sion of oxygen counterflow to the carbon monoxide that is formed on the cylindrical surface.

the correct answer is b. a strong acid completely dissociates to its ions when dissolved in water. completely dissociates to and ions. a is incorrect because does not fully ionize to and ions and some remain as the compound . c and d are incorrect because, and do not fall into the category of bronsted lowry acids. a bronsted lowry acid is a proton donor and since both molecules do not have a proton to donate they are not bronsted lowry acids. likewise,   if we use the lewis acid definition, they cannot be acids. a lewis acid is an electron pair acceptor. both and have a complete octet so can not accept any electrons which disqualifies them as acids.